Daniel V. Esposito, Alec Talin, Thomas Moffat
American Institute of Chemical Engineers
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Daniel V. Esposito, Youngmin Lee, A. Alec Talin, Thomas P. Moffat
American Institute of Chemical Engineers
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Daniel V. Esposito, Youngmin Lee, A. Alec Talin, Thomas P. Moffat
American Institute of Chemical Engineers
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Daniel V. Esposito, Youngmin Lee, Veronika A. Szalai, A. Alec Talin, Thomas P. Moffat
American Institute of Chemical Engineers
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Daniel V. Esposito, Youngmin Lee, A. Alec Talin, Thomas P. Moffat
American Institute of Chemical Engineers
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Daniel V. Esposito, Youngmin Lee, Veronika A. Szalai, A. Alec Talin, Thomas P. Moffat
American Institute of Chemical Engineers
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Daniel V. Esposito, Youngmin Lee, A. Alec Talin, Thomas P. Moffat
American Institute of Chemical Engineers
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Daniel V. Esposito, Youngmin Lee, Veronika A. Szalai, A. Alec Talin, Thomas P. Moffat
American Institute of Chemical Engineers
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Daniel V. Esposito, Youngmin Lee, A. Alec Talin, Thomas P. Moffat
American Institute of Chemical Engineers
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David B. Ingram, Suljo Linic
American Institute of Chemical Engineers
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Daniel V. Esposito, Youngmin Lee, A. Alec Talin, Thomas P. Moffat
American Institute of Chemical Engineers
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Christopher Bohn, Alec Talin, Veronika Szalai
American Institute of Chemical Engineers
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