127d. Reaction Mechanisms in Plasma Etching of High-K Materials

127d. Reaction Mechanisms in Plasma Etching of High-K Materials

Author(s):: Jane P. Chang
Publication title:: AIChE annual meeting, Philadelphia 100 : conference proceedings : 1908 to 2008 : 2008 AIChE annual meeting, Philadelphia, PA, November 16-21, 2008. Non-topical conferences
Title of ser.:: AIChE Conference Proceedings
Ser. no.:: P-255
Pub. Year:: 2008
Pt.:: 8
Page(from):: P110431
Pub. info.:: New York: American Institute of Chemical Engineers
ISBN:: 9780816910502 [0816910502]
Language:: English
Call no.:: A08000/2008 [CD-ROM]
Type:: Conference Proceedings

Details

TDL ID:	ZA00061216
Series ID:	PA00000008
Conf. info. (Name):	AIChE Annual Meeting ; Particle Technology Forum ; North American Mixing Forum ; Computational Molecular Science and Engineering Forum ; Nanoscale Science and Engineering Forum ; Sustainable Engineering Forum
Conf. info. (Number):	2008
Conf. info. (Venue):	Philadelphia, PA, USA
Conf. info. (Date):	2008.11.16-2008.11.21
Note for article:	[HTML document] 2008 AIChE Annual Meeting. Materials Engineering and Sciences Division, Philadelphia, PA, November 16-21, 2008

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