264a. Bottom-Up Synthesis Of Device-Level Mesoporous Silica, Using Photolithography And Supercritical CO2

264a. Bottom-Up Synthesis Of Device-Level Mesoporous Silica, Using Photolithography And Supercritical CO₂

Author(s):

Publication title:

2007 AIChE annual meeting : Salt Palace Convention Center, Salt Lake City, Utah, November 4-9, 2007 : conference proceedings. Non-Topical Conference

Title of ser.:

AIChE Conference Proceedings

Ser. no.:

P-246

Pub. Year:

2007

Pt.:

22

Page(from):

P95083

Pub. info.:

New York: American Institute of Chemical Engineers

ISBN:

9780816910229 [0816910227]

Language:

English

Call no.:

A08000/2007 [CD-ROM]

Type:

Conference Proceedings

Details

TDL ID:	ZA00061214
Series ID:	PA00000008
Conf. info. (Name):	AIChE Annual Meeting ; Particle Technology Forum ; North American Mixing Forum ; Computational Molecular Science and Engineering Forum ; Nanoscale Science and Engineering Forum ; Sustainable Engineering Forum
Conf. info. (Number):	2007
Conf. info. (Venue):	Salt Lake City, UT, USA
Conf. info. (Date):	2007.11.04-2007.11.09
Note for article:	[html file] 2007 AIChE annual meeting, Salt Palace Convention Center, Salt Lake City, Utah, November 4-9, 2007. Nanoscale Science and Engineering Forum

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