Jianghui Wang, Daniel J. Klingenberg
American Institute of Chemical Engineers
|
J. R. Samaniuk, C. Tim Scott, T. W. Root, D. J. Klingenberg
American Institute of Chemical Engineers
|
Joseph R. Samaniuk, C. Tim Scott, Thatcher W. Root, Daniel J. Klingenberg
American Institute of Chemical Engineers
|
J. R. Samaniuk, D. J. Klingenberg, T. W. Root, C. Tim Scott
American Institute of Chemical Engineers
|
Joseph R. Samaniuk, C. Tim Scott, Thatcher W. Root, Daniel J. Klingenberg
American Institute of Chemical Engineers
|
J. R. Samaniuk, D. J. Klingenberg, T. W. Root, C. Tim Scott
American Institute of Chemical Engineers
|
Joseph R. Samaniuk, C. Tim Scott, Thatcher W. Root, Daniel J. Klingenberg
American Institute of Chemical Engineers
|
J. R. Samaniuk, D. J. Klingenberg, T. W. Root, C. Tim Scott
American Institute of Chemical Engineers
|
Joseph R. Samaniuk, C. Tim Scott, Thatcher W. Root, Daniel J. Klingenberg
American Institute of Chemical Engineers
|
J. R. Samaniuk, D. J. Klingenberg, T. W. Root, C. Tim Scott
American Institute of Chemical Engineers
|
J. R. Samaniuk, C. Tim Scott, T. W. Root, D. J. Klingenberg
American Institute of Chemical Engineers
|
Jianghui Wang, Emilio Tozzi, Michael D. Graham, Daniel Klingenberg
American Institute of Chemical Engineers
|