Matthew W. Eggert, Andrew N. Wilson, John A. Cooey, Mark E. Byrne, Robert P. Chambers
American Institute of Chemical Engineers
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Dhanalakshmi J., Mandal Sujan, Sai P.S.T., Balakrishnan A.R.
American Institute of Chemical Engineers
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Eriksson, C., Qvist, I., Vallentin, K.
American Chemical Society
|
Scheller, F., Warsinke, A., Lutter, J., Renneberg, R., Schubert, F.
American Chemical Society
|
YoshidaAkira, Hsu L., yasunami M.
Plenum Press
|
Craddock M. Valda
Plenum Press
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Paulson, G. D., Feil, V. J., Sommer, P. J., Lamoureux, C. H.
American Chemical Society
|
Hoffman E. N., Hondred jD., Brown D. H. A., Hanson D. A.
Springer-Verlag
|
Robert P. Chambers, Haodi Dong
American Institute of Chemical Engineers
|
Matthew W. Eggert, Mark E. Byrne, Robert P. Chambers
American Institute of Chemical Engineers
|
Pappas P., Vasiliou V., Karageorgou M., Marselos M.
Plenum Press
|
Matthew W. Eggert, Mark E. Byrne, Robert P. Chambers
American Institute of Chemical Engineers
|