Atomic-Scale Analysis of Silicon Hydride Dissociation on Surfaces of Plasma-Deposited Amorphous Silicon Thin Films

Atomic-Scale Analysis of Silicon Hydride Dissociation on Surfaces of Plasma-Deposited Amorphous Silicon Thin Films

Author(s):

Publication title:

2006 AIChE annual meeting, November 12-17, 2006, San Francisco, California, San Francisco Hilton : conference proceedings. Non-topical conferences

Title of ser.:

AIChE Conference Proceedings

Ser. no.:

P-235

Pub. Year:

2006

Pt.:

1

Pub. info.:

New York: American Institute of Chemical Engineers

ISBN:

9780816910120 [081691012X]

Language:

English

Call no.:

A08000/2006 [CD-ROM]

Type:

Conference Proceedings

Details

TDL ID:	ZA00061211
Series ID:	PA00000008
Conf. info. (Name):	AIChE Annual Meeting ; Particle Technology Forum ; North American Mixing Forum ; Computational Molecular Science and Engineering Forum ; Nanoscale Science and Engineering Forum ; Sustainable Engineering Forum
Conf. info. (Number):	2006
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	2006.11.12-2006.11.17
Note for article:	AIChE annual meeting conference, November 12-17, 2006, San Francisco, CA. Engineering Sciences and Fundamentals

Similar Items:

1 Conference Proceedings 446b. Atomic-Scale Analysis Of The Role Of Surface Cordination Defects In The Growth Of Amorphous Silicon Thin Films Mayur S. Valipa, Tejinder Singh, Dimitrios Maroudas American Institute of Chemical Engineers	7 Conference Proceedings 370b. Kinetic Monte Carlo Simulations of Surface Growth during Plasma Deposition of Silicon Thin Films Sumeet C. Pandey, Tejinder Singh, Dimitrios Maroudas American Institute of Chemical Engineers
2 Conference Proceedings 564b. Atomic-Scale Analysis of Radical Precursor and Hydrogen Surface Diffusion on Plasma-Deposited Amorphous Silicon Thin Films Mayur S. Valipa, Tamas Bakos, Eray S. Aydil, Dimitrios Maroudas American Institute of Chemical Engineers	8 Conference Proceedings 472g. First-Principles Theoretical Analysis Of Carbon Nanostructures And New Carbon Allotropes Tejinder Singh, Michael J. Behr, Mayur S. Valipa, Eray S. Aydil, Dimitrios Maroudas American Institute of Chemical Engineers
3 Conference Proceedings The Role of SiH3 Diffusion in Determining the Surface Smoothness of Plasma-Deposited Amorphous Si Thin Films: An Atomic-Scale Analysis Valipa, S. Mayur, Bakos, Tamas, Aydil, Eray S., Maroudas, Dimitrios Materials Research Society	9 Conference Proceedings Surface Processes During Growth of Hydrogenated Amorphous Silicon Aydil, Eray S., Agarwal, Sumit, Valipa, Mayur, Sriraman, Saravanapriyan, Maroudas, Dimitrios Materials Research Society
4 Conference Proceedings 135b. Analysis of Chemical Reactions between Radical Growth Precursors Adsorbed on Plasma-Deposited Silicon Thin-Film Surfaces Tamas Bakos, Mayur S. Valipa, Dimitrios Maroudas American Institute of Chemical Engineers	10 Conference Proceedings Atomic-Scale Analysis of the Reactivity of Radicals from Silane/Hydrogen Plasmas With silicon Surfaces Ramalingam, Shyam., Maroudas, Dimitrios., Aydil, Eray S. MRS - Materials Research Society
5 Conference Proceedings 56d. Surface Smoothening Mechanism of Plasma-Deposited Amorphous Silicon Thin Films Mayur S. Valipa, Tamas Bakos, Eray S. Aydil, Dimitrios Maroudas American Institute of Chemical Engineers	11 Conference Proceedings 208e. Atomic-Scale Analysis of the Interactions Between Atomic Hydrogen and Multi-Walled Carbon Nanotubes Andre R. Muniz, Tejinder Singh, Michael J. Behr, Eray S. Aydil, Dimitrios Maroudas American Institute of Chemical Engineers
6 Conference Proceedings (378e) First-Principles-Based Kinetic Modeling of Surface Growth During Plasma Deposition of Silicon Thin Films Sumeet C. Pandey, Tejinder Singh, Dimitrios Maroudas American Institute of Chemical Engineers	12 Conference Proceedings Atomic-Scale Analysis of Strain Relaxation Mechanisms in Ultra-Thin Metallic Films Rauf Gungor, M., Maroudas, Dimitrios Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12