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375a. Using High Fidelity Simulation in the Design of Experiments for Optimizing Etch Uniformity in Plasma Etching Reactors

Author(s):
Publication title:
2005 annual meeting & fall showcase : '05 AIChE, Oct 30 - Nov 4 : conference proceedings, Cincinnati Convention Center, Cincinnati, OH : non-topical presentation records : 10. Computing and Systems Technology Division
Title of ser.:
AIChE Conference Proceedings
Ser. no.:
P-221(2)
Pub. Year:
2005
Pages:
1
Pub. info.:
New York: American Institute of Chemical Engineers
ISBN:
9780816909964 [0816909962]
Language:
English
Call no.:
A08000/2005 [CD-ROM]
Type:
Conference Proceedings

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