Daniel A. Heller, Seunghyun Baik, Thomas E. Eurell, Michael S. Strano
American Institute of Chemical Engineers
|
Paul W. Barone, Michael S. Strano
American Institute of Chemical Engineers
|
Michael Strano, Paul W. Barone, Hyeonseok Yoon
American Institute of Chemical Engineers
|
Paul W. Barone, Michael S. Strano
American Institute of Chemical Engineers
|
Daniel A. Heller, Hong Jin, Michael S. Strano
American Institute of Chemical Engineers
|
Jingqing Zhang, Jong-Ho Kim, Hong Jin, Paul W. Barone, Daniel A. Heller
American Institute of Chemical Engineers
|
Michael S. Strano, Daniel Heller, Esther S. Jeng
American Institute of Chemical Engineers
|
Daniel A. Heller, Michael S. Strano
American Institute of Chemical Engineers
|
Daniel A. Heller, Hong Jin, Michael S. Strano
American Institute of Chemical Engineers
|
Paul W. Barone, René Ortiz, Jingqing Zhang, Michael S. Strano
American Institute of Chemical Engineers
|
Paul W. Barone, Michael S. Strano
American Institute of Chemical Engineers
|
Daniel A. Heller, Seunghyun Baik, Anthonie E. Moll, Tsun-Kwan Yeung, Thomas E. Eurell
American Institute of Chemical Engineers
|