135b. Analysis of Chemical Reactions between Radical Growth Precursors Adsorbed on Plasma-Deposited Silicon Thin-Film Surfaces

135b. Analysis of Chemical Reactions between Radical Growth Precursors Adsorbed on Plasma-Deposited Silicon Thin-Film Surfaces

Author(s):

Publication title:

2005 annual meeting & fall showcase : '05 AIChE, Oct 30 - Nov 4 : conference proceedings, Cincinnati Convention Center, Cincinnati, OH : non-topical presentation records : 01. Engineering Sciences and Fundamentals

Title of ser.:

AIChE Conference Proceedings

Ser. no.:

P-221(2)

Pub. Year:

2005

Pages:

1

Pub. info.:

New York: American Institute of Chemical Engineers

ISBN:

9780816909964 [0816909962]

Language:

English

Call no.:

A08000/2005 [CD-ROM]

Type:

Conference Proceedings

Details

TDL ID:	ZA00061192
Series ID:	PA00000008
Conf. info. (Name):	AIChE Annual Meeting
Conf. info. (Number):	2005
Conf. info. (Venue):	Cincinnati, OH, USA
Conf. info. (Date):	2005.10.30-2005.11.04
Note for article:	AIChE 2005 Annual Meeting, Oct 30-Nov 4, Cincinnati, OH

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