Aleksandra Dominik, Adam S. Bymaster, Walter G. Chapman
American Institute of Chemical Engineers
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Aleksandra Dominik, Shekhar Jain, Walter G. Chapman
American Institute of Chemical Engineers
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Adam S. Bymaster, Shekhar Jain, Walter G. Chapman
American Institute of Chemical Engineers
|
Le Wang, Amin Haghmoradi, Walter G. Chapman
American Institute of Chemical Engineers
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Zhengzheng Feng, Chris Emborsky, Kenneth R. Cox, Walter G. Chapman
American Institute of Chemical Engineers
|
Le Wang, Amin Haghmoradi, Clarence A. Miller, George J. Hirasaki, Walter G. Chapman
American Institute of Chemical Engineers
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Shekhar Jain, Adam S. Bymaster, Walter G. Chapman
American Institute of Chemical Engineers
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Le Wang, Pradeep Venkataraman, George J. Hirasaki, Clarence A. Miller, Walter G. Chapman
American Institute of Chemical Engineers
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Zhengzheng Feng, Christopher Emborsky, Kenneth R. Cox, Walter G. Chapman
American Institute of Chemical Engineers
|
Xiaoqun Mu, Le Wang, Amin Haghmoradi, Walter G. Chapman
American Institute of Chemical Engineers
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Zhengzheng Feng, Christopher Emborsky, Kenneth R. Cox, Walter G. Chapman
American Institute of Chemical Engineers
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Adam S. Bymaster, Aleksandra Dominik, Walter G. Chapman
American Institute of Chemical Engineers
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