Control and Signal Processing for Photoresist Processing in Microlithography

Control and Signal Processing for Photoresist Processing in Microlithography

Author(s):

Publication title:

03 AIChE annlual meeting, November 16-21, San Francisco, California, AIChE 2003 annual meeting conference proceedings

Title of ser.:

AIChE Conference Proceedings

Ser. no.:

P-201

Pub. Year:

2003

Page(from):

439r

Pages:

22

Pub. info.:

New York: American Institute of Chemical Engineers

ISBN:

9780816909414 [0816909415]

Language:

English

Call no.:

A08000/2003 [CD-ROM]

Type:

Conference Proceedings

Details

TDL ID:	ZA00061142
Series ID:	PA00000008
Conf. info. (Name):	AIChE Annual Meeting
Conf. info. (Number):	2003
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	2003.11.16-2003.11.21
Note for article:	2003 Annual Meeting, San Francisco, California November 16-21, 2003

Similar Items:

1 Conference Proceedings In-situ Measurement and Control for Photoresist Processing in Microlithography Arthur Tay, Weng-Khuen Ho, Xiaodong Wu, Choon-Meng Kiew American Institute of Chemical Engineers	7 Conference Proceedings Real-time control of photoresist absorption coefficient uniformity Tay, A., Ho, W. -K., Wu, X., Tsai, K. -Y. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Fault detection and estimation of wafer warpage profile during thermal processing in microlithography Arthur Tay, Weng Khuen Ho, Ni Hu, Ying Zhou American Institute of Chemical Engineers	8 Conference Proceedings Real-time spatial control of photoresist development rate A. Tay, W. Ho, N. Hu, C. Kiew, K. Tsai SPIE - The International Society of Optical Engineering
3 Conference Proceedings Iterative Feedback Tuning Control of Photoresist Film Thickness Uniformity Ying Zhou, Weng-Khuen Ho, Arthur Tay, Jiewen Deng, Boon-Keng Lok American Institute of Chemical Engineers	9 Conference Proceedings Real-time control of photoresist thickness uniformity during the bake process Lee,L.L., Schaper,C.D., Khuen,H.W. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Spatially programmable thermal processing module for 300-mm wafer processing Tay,A.E., Lim,K.W., Loh,A.P., Tan,W.W., Ho,W.K., Huang,A., Jun,F. SPIE-The International Society for Optical Engineering	10 Conference Proceedings CD uniformity control via real-time control of photoresist properties M. Chen, J. Fu, W. K. Ho, A. Tay Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography [6155-08] Tay, A., Ho, W. -K., Hu, N., Tsai, K.Y., Zhou, Y. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Lethality-Based Model Predictive Control of Themal Processes for Shelf Stable Foods in Batch and Hydrostatic Sterlizers Weng, Z. American Institute of Chemical Engineers
6 Conference Proceedings Real-time control of photoresist development process Tay, A., Ho, W. -K., Kiew, C. -M., Zhou, Y., Lee, J. H. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Minimum-time optimal feedforward control of conductive heating systems for microelectronics processing of silicon wafers and quartz photomasks Ho,W.K., Tay,A. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12