Influence of Al2O3 Buffer Layers on the Properties of Indium-Tin Oxide Films on PET Substrate by RF-Magnetron Sputtering

Influence of Al₂O₃ Buffer Layers on the Properties of Indium-Tin Oxide Films on PET Substrate by RF-Magnetron Sputtering

Author(s):

Publication title:

Advanced material science and technology : selected, peer reviewed papers from the 7th International Forum on Advanced Material Science and Technology, June 26-28, 2011, Dalian, China (IFAMST-7)

Title of ser.:

Materials science forum

Ser. no.:

675-677

Pub. Year:

2011

Pt.:

2

Page(from):

1209

Page(to):

1212

Pages:

4

Pub. info.:

Aedermannsdorf, Switzerland: Trans Tech Publications

ISSN:

02555476

Language:

English

Call no.:

M23650

Type:

Conference Proceedings

Details

TDL ID:	ZA00054175
Series ID:	PA00000012
Conf. info. (Name):	International Forum on Advanced Material Science and Technology
Conf. info. (Number):	7th
Conf. info. (Venue):	Dalian, China
Conf. info. (Date):	2011.06.26-2011.06.28
Note for article:	7th International Forum on Advanced Material Science and Technology, June 26-28, 2011, Dalian, China (IFAMST-7)

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