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Microstructure and Electric Transport Characteristic of Microcrystalline Silicon Films Fabricated by Very High Frequency Plasma Enhanced Chemical Vapor Deposition

Author(s):
Publication title:
Optoelectronic materials : Selected, peer reviewed papers from the 2010 International Conference on Optical, Electronic and Electrical Materials, August 1-4, Kunming, China, OEEM 2010
Title of ser.:
Materials science forum
Ser. no.:
663-665
Pub. Year:
2010
Pt.:
1
Page(from):
600
Page(to):
603
Pages:
4
Pub. info.:
Aedermannsdorf, Switzerland: Trans Tech Publications
ISSN:
02555476
Language:
English
Call no.:
M23650
Type:
Conference Proceedings

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