Advanced Gate Dielectric Development for VLSI Technology

Advanced Gate Dielectric Development for VLSI Technology

Author(s):: Y. Ma
Publication title:: Rapid thermal processing and beyond : applications in semiconductor processing : special topic volume : selected papers from RTP specialists all over the world, Dornstadt, Germany
Title of ser.:: Materials science forum
Ser. no.:: 573-574
Pub. Year:: 2008
Page(from):: 133
Page(to):: 146
Pages:: 14
Pub. info.:: Aedermannsdorf, Switzerland: Trans Tech Publications
ISSN:: 02555476
Language:: English
Call no.:: M23650
Type:: Conference Proceedings

Details

TDL ID:	ZA00054119
Series ID:	PA00000012

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