The Semiconductor Industry's Nanoelectronics Research Initiative: Motivation and Challenges

Author(s):

J. Welser  

Publication title:

Advanced gate stack, source/drain and channel engineering for Si-based CMOS 4 : new materials, processes and equipment

Title of ser.:

ECS transactions

Ser. no.:

13(1)

Pub. Year:

2008

Page(from):

3

Page(to):

10

Pages:

8

Pub. info.:

Pennington, N.J.: Electrochemical Society

ISSN:

19385862

ISBN:

9781566776264 [1566776260]

Language:

English

Call no.:

E23400/13-1

Type:

Conference Proceedings