Metrology, Analysis and Characterization in Micro- and Nanotechnologies - A European Challenge

Metrology, Analysis and Characterization in Micro- and Nanotechnologies - A European Challenge

Author(s):

Publication title:

Analytical Techniques for Semiconductor Materials and Process Characterization 5 (ALTECH 2007) (plus Analytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes)

Title of ser.:

ECS transactions

Ser. no.:

10(1)

Pub. Year:

2007

Page(from):

35

Page(to):

49

Pages:

15

Pub. info.:

Pennington, N.J.: Electrochemical Society

ISSN:

19385862

ISBN:

9781604238259 [1604238259]

Language:

English

Call no.:

E23400/10-1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013288
Series ID:	PA00000034
Conf. info. (Name):	Analytical Techniques for Semiconductor Materials and Process Characterization - ALTECH
Conf. info. (Number):	2007
Conf. info. (Venue):	Munich, Germany
Conf. info. (Date):	2007.09.13-2007.09.14
Note for article:	Analytical Techniques for Semiconductor Materials and Process Characterization 5 (ALTECH 2007), September 13 - September 14, 2007, Munich, Germany

Similar Items:

1 Conference Proceedings Trends in European R&D - Advanced Process Control Down to Atomic Scale for Micro- and Nanotechnologies L. Pfitzner, M. Schellenberger, R. Oechsner, G. Roeder, M. Pfeffer Electrochemical Society	7 Conference Proceedings Application and cost analysis of scatterometry for integrated metrology Benesch,N., Schneider,C., Pfitzner,L., Ryssel,H. SPIE - The International Society for Optical Engineering
2 Conference Proceedings Scenario for a Yield Model Based on Reliable Defect Density Data and Linked to Advanced Process Control A. Nutsch, R. Oechsner Electrochemical Society	8 Conference Proceedings Performance Optimization of Semiconductor Manufacturing Equipment by the Application of Discrete Event Simulation Markus Pfeffer, Richard Oechsner, Lothar Pfitzner, Heiner Ryssel, Berthold Ocker, Patrick Verdonck American Society of Mechanical Engineers
3 Conference Proceedings Process Optimization by Means of Integrated Monitoring Tools in the Semiconductor Industry L.H. Pfitzner, A. Nutsch, G. Roeder, M. Schellenberger Electrochemical Society	9 Conference Proceedings Application of laser plasma soft x-ray and EUV sources in micro- and nanotechnology H. Fiedorowicz, A. Bartnik, K. Jakubczak, R. Jarocki, L. Juha, J. Kostecki, L. Pina, R. Rakowski, M. Szczurek SPIE - The International Society of Optical Engineering
4 Conference Proceedings The critical role of metrology in nanotechnology Schattenburg, M.L., Smith, H.I. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Integrated metrology: an enabler for advanced process control (APC) Schneider,C., Pfitzner,L., Ryssel,H. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Determination of flatness on patterned wafer surfaces using wavefront sensing methods A. Nutsch, L. Pfitzner, T. Grandin, X. Levecq, S. Bucourt Society of Photo-optical Instrumentation Engineers	11 Conference Proceedings Characterization of Thin ZnO Films by Vacuum Ultra-violet Reflectometry T. Gumprecht, P. Petrik, G. Roeder, M. Schellenberger, L. Pfitzner Materials Research Society
6 Conference Proceedings Nanometer-scale metrology: meeting the nanotechnology measurement challenges Postek, M.T., Jr. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Metrology challenges for advanced lithography techniques I. Englard, P. Vanoppen, J. Finders, I. Minnaert-Janssen, F. Duray, J. Meessen, G. Janssen, O. Adan, L. Gershtein, R. … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12