Reactive Ion Etching of Y2O3 Films Applying F-, Cl- and Cl/Br-Based Inductively Coupled Plasmas

Reactive Ion Etching of Y₂O₃ Films Applying F-, Cl- and Cl/Br-Based Inductively Coupled Plasmas

Author(s):

Publication title:

Science and Technology of Dielectrics for Active and Passive Photonic Devices

Title of ser.:

ECS transactions

Ser. no.:

3(11)

Pub. Year:

2006

Page(from):

117

Page(to):

124

Pages:

8

Pub. info.:

Pennington, N.J.: Electrochemical Society

ISSN:

19385862

ISBN:

9781566775151 [1566775159]

Language:

English

Call no.:

E23400/3-11 [11]

Type:

Conference Proceedings

Details

TDL ID:	ZA00014278
Series ID:	PA00000034
Conf. info. (Name):	ECS Meeting
Conf. info. (Number):	210th
Conf. info. (Venue):	Cancun, Mexico
Conf. info. (Date):	2006.10.29-2006.11.03
Note for article:	210th ECS Meeting, October 29-November 3, 2006, Cancun, Mexico

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