Characterization of Surface Preparation for Epitaxial SiGe Process using X-ray Reflectivity

Characterization of Surface Preparation for Epitaxial SiGe Process using X-ray Reflectivity

Author(s):

Publication title:

Solid-State Joint Posters (General)

Title of ser.:

ECS transactions

Ser. no.:

2(10)

Pub. Year:

2007

Page(from):

63

Page(to):

69

Pages:

7

Pub. info.:

Pennington, N.J.: Electrochemical Society

ISSN:

19385862

ISBN:

9781566775212 [1566775213]

Language:

English

Call no.:

E23400/2-9 [10]

Type:

Conference Proceedings

Details

TDL ID:	ZA00046583
Series ID:	PA00000034
Conf. info. (Name):	ECS Meeting
Conf. info. (Number):	209th
Conf. info. (Venue):	Denver, Colorado, USA
Conf. info. (Date):	2006.05.07-2006.05.12
Note for article:	209th ECS Meeting, May 7-May 12, 2006, Denver, Colorado

Similar Items:

1 Conference Proceedings Comparison between the atomic force microscopy and x-ray reflectivity on the characterization of the roughness of a surface Su, H.-C., Lin, M.-Z., Huang, T.-W., Lee, C.-H. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Using Thermal Oxidation and Rapid Thermal Annealing on Polycrystalline-SiGe for Ge Nanocrystals Chyuan-Haur Kao, C. S. Lai, M. C. Tsai, C. H. Lee, C. S. Huang, C. R. Chen Materials Research Society
2 Conference Proceedings CHARACTERIZATION OF SiGe EPITAXIAL FILMS USING ELLIPSOMETRY AND X-RAY FLUORESCENCE Munukutla, L.V., Evans, K., Liaw, M.H. Materials Research Society	8 Conference Proceedings CHARACTERIZATION OF INTERFACES IN SiGe SUPERLATTICES BY COMBINED GRAZING INCIDENCE X-RAY FLUORESCENCE AND REFLECTIVITY Powell, Adrian R., Bradler, jaroslav, Thomas, Charles R., Kubiak, Richard A., Bowen, D. Keith, Wormington, Matthew, … Materials Research Society
3 Conference Proceedings THERMAL DEGRADATION OF SiGe INTERFACES STUDIED BY X-RAY REFLECTIVITY AND DIFFRACTION Hudson, , J. M., Powell, A. R., Bowen, D. K., Wormington, M., Tanner, B. K., Kubiak, R. A., Parker, E. H. C. Materials Research Society	9 Conference Proceedings 90-nm lithography process characterization using ODP scatterometry technology Ke, C.-M., Yu, S.-S., Wang, Y.-H., Chou, Y.-J., Chen, J.-H., Lee, B.-H., Chu, H.-Y., Lin, H.-T., Gau, T.-S., Lin, C.-H., … SPIE - The International Society of Optical Engineering
4 Conference Proceedings Characterizing pattern structures using x-ray reflectivity H. Lee, C. L. Soles, H. W. Ro, S. Kang, E. K. Lin, A. Karim, W. Wu, D. R. Hines SPIE - The International Society of Optical Engineering	10 Conference Proceedings Selective Epitaxial Growth of SiGe Films in LPCVD Reactor Systems- Characterization of SiGe Films by Ellipsometry Lee, I.M., Wang, W.C., Koh, M.T.K., Denton, J.P., Takoudis, C.G., Kram, E.P., Neudeck, G.W. Electrochemical Society
5 Conference Proceedings Nanostructures on Epitaxial SiGe Films in Silicon Chen, L J., Wu, W. W., Lee, S. W., Chen, H., Yang, T. H. Electrochemical Society	11 Conference Proceedings INTERFACE STRUCTURE OF EPITAXIAL AND Nb FILMS ON SAPPHIRE: GRAZING INCIDENCE X-RAY DIFFRACTION AND X-RAY REFLECTIVITY STUDIES Lee, C.H., Liang, K.S., Shieu, F.S., Sass, S.L., Flynn, C.P. Materials Research Society
6 Conference Proceedings X-RAY CHARACTERIZATION OF BORON DELTA LAYERS IN Si AND SiGe Powell, A.R., Kubiak, R.A., Whall, T.E., Parker, E.C.H., Bowen, D.K. Materials Research Society	12 Conference Proceedings Characterization of Semiconductor Surfaces and Interfaces by X-Ray Reflectivity Measurements Plotz,W., Holy,V., Hoogenhof,W.V.D., Ahrer,W., Frank,N., Schiller,C., Lischka,K. Trans Tech Publications

1

2

3

4

5

6

7

8

9

10

11

12