Blank Cover Image

Effects of Carbon Co-Implantation on Transient Enhanced Diffusion and Performances of the Phosphorus Doped Ultra-Shallow Junction Nano NMOSFET

Author(s):
Publication title:
Innovation for applied science and technology : selected, peer reviewed papers from the Second International Conference on Engineering and Technology Innovation 2012, November 2-6, 2012, Kaohsiung, Taiwan, R. O. C.
Title of ser.:
Applied mechanics and materials
Ser. no.:
284-287
Pub. Year:
2013
Vol.:
1
Page(from):
98
Page(to):
102
Pages:
5
Pub. info.:
Stafa-Zuerich: Trans Tech Publications
ISSN:
16609336
ISBN:
9781627480550 [1627480552]
Language:
English
Call no.:
A69500/284
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Modeling Ultra Shallow Junctions Formed by Phosphorus-Carbon and Boron-Carbon Co-Implantation

Christoph Zechner, Dmitri Matveev, Nikolas Zographos, Victor Moroz, Bartek Pawlak

Materials Research Society
7 Conference Proceedings Ultra-Shallow Junctions Formed by Co-Implantation and Sub-Melt Laser Annealing

S. B. Felch, A. Falepin, S. Seven, E. Augendre, T. Noda, V. Parihar, F. Nouri, T. Hoffinann, B. Pawlak, P. Eyben, W. …

Electrochemical Society
2 Conference Proceedings Transient Enhanced Diffusion for Ultra Low Energy Boron, Phosphorus, and Arsenic Implantation in Silicon

Amitabh, Ning Yu, Mercer, Doug

MRS - Materials Research Society
8 Conference Proceedings Transient Enhanced Diffusion of Phosphorus and Defect Evolution in P+ Implanted Si

Li, J., Keys, P., Chen, J., Law, M. E., Jones, K. S., Jasper, C.

MRS - Materials Research Society
3 Conference Proceedings Ultra Shallow Junctions Optimization With Non-Doping Species Co-Implantation

Nathalie Cagnat, Cyrille Laviron, Daniel Mathiot, Blandine Duriez, Julien Singer, Romain Gwoziecki, Frederic Salvetti, …

Materials Research Society
9 Conference Proceedings Boron Transient-Enhanced Diffusion in Heavily Phosphorus-Doped Silicon

Huang, M. B., Myler, U., Simpson, T. W., Simpson, P. J., Mitchell, I. V.

MRS - Materials Research Society
4 Conference Proceedings Shallow Junction Engineering by Phosphorus and Carbon Co-Implantation: Optimization of Carbon Dose and Energy

Nathalie Cagnat, Cyrille Laviron, Daniel Mathiot, Chris Rando, Marc Juhel

Materials Research Society
10 Conference Proceedings Modeling Silicon Implantation Damage and Transient-Enhanced Diffusion Effects for Silicon Technology Development

Giles, Martin D., Yu, Shaofeng, Kennel, Harold W., Packan, Paul A.

MRS - Materials Research Society
5 Conference Proceedings Post-Oxidation Enhanced Diffusion Of Low-Energy Implanted Boron In Ultra-Shallow P+/N Junctions Formation

Lenoble, Damien, Halimaoui, Aomar, Grouillet, Andre

Materials Research Society
11 Conference Proceedings Ultra Shallow Junction Formation by Cluster Ion Implantation

Matsuo, Jiro, Aoki, Takaaki, Goto, Ken-ichi, Sugii, Toshihiro, Yamada, Isao

MRS - Materials Research Society
6 Conference Proceedings EFFECTS OF CONCURRENT Co OR Ti SILICIDATION ON TRANSIENT DIFFUSION AND END-OF-RANGE DAMAGE IN PHOSPHORUS IMPLANTED SILICON

Honeycutt, J. W., Ravi, J., Rozgonyi, G. A.

Materials Research Society
12 Conference Proceedings Theoretical Investigation of Implanted Dopant Diffusion From a Silicide Layer to the Silicon Wafer for Ultra Shallow P-N Junction Formation

Sinder, M., Pelleg, J.

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12