Comparison of Nanomechanical Behavior of the Amorphous and Crystalline Phases of ALD HfO2

Comparison of Nanomechanical Behavior of the Amorphous and Crystalline Phases of ALD HfO2

Author(s):

Publication title:

Atomic layer deposition applications 4

Title of ser.:

ECS transactions

Ser. no.:

16(4)

Pub. Year:

2007

Page(from):

269

Page(to):

277

Pages:

9

Pub. info.:

Pennington, N.J.: Electrochemical Society

ISSN:

19385862

ISBN:

9781566776509 [1566776503]

Language:

English

Call no.:

E23400/11-4

Type:

Conference Proceedings

Details

TDL ID:	ZA00052898
Series ID:	PA00000034
Conf. info. (Name):	Symposium on Atomic Layer Deposition Applications ; Meeting of the Electrochemical Society
Conf. info. (Number):	4th ; 214th
Conf. info. (Venue):	Honolulu, Hawaii, USA
Conf. info. (Date):	2008.10.13-2008.10.15
Note for article:	4th Symposium on Atomic Layer Deposition Applications, 214th Meeting of the Electrochemical Society, Honolulu, Hawaii, October 13-15, 2008

Similar Items:

1 Conference Proceedings Electrical Properties of High-κ ALD HfO2 Deposited on Strained Si Layers Epitaxially Grown on Si0.8Ge0.2/Si Substrates P.R. Shrestha, D. Gu, K. Tapily, H. Baumgart Electrochemical Society	7 Conference Proceedings Tuning the Absolute Band Gap of Silicon Photonic Crystals by Atomic Layer Deposition (ALD) Interfacial Layers M. Thitsa, D. Gu, H. Baumgart, S. Albin Electrochemical Society
2 Conference Proceedings Experimental Study of ALD HfO2 Deposited on Strained Silicon-on-Insulator (sSOI & xsSOI) and SOI D. Gu, K. Tapily, P. Shrestha, G. Celler, H. Baumgart Electrochemical Society	8 Conference Proceedings Electrochemical Pitting and Repassivation on Icosahedral Al-Cu-Fe, and a Comparison With Crystalline Phases Spurr, N. A., Pinhero, P. J., Sordelet, D. J., Hebert, K. R., Thiel, P. A. MRS - Materials Research Society
3 Conference Proceedings Nanomechanical Properties of High-Κ Dielectrics Grown by Atomic Layer Deposition K. Tapily, J. Jakes, D. Stone, P. Shrestha, D. Gu Electrochemical Society	9 Conference Proceedings Synthesis of Zirconia and Hafnia Tubes by Atomic Layer Deposition (ALD) Template Method T.M. Abdel-Fattah, D. Gu, H. Baumgart, G. Namkoong Electrochemical Society
4 Conference Proceedings Effect of Wafer Bonding and Layer Splitting on Nanomechanical Properties of Standard and Strained SOI Films K. Tapily, H. Baumgart, D. Gu, A. Elmustafa, M. Krause Electrochemical Society	10 Conference Proceedings ALD HfO2 Surface Preparation Study Delabie, Annelies, Caymax, M., Maes, J.W., Bajolet, P., Brijs, B., Cartier, E., Conard, T., Gendt, S.De, Richard, O., … Materials Research Society
5 Conference Proceedings THE CRYSTALLINE-TO-AMORPHOUS PHASE TRANSITION IN IRRADIATED SILICON Seidman, D.N., Averback, R.S., Okamoto, P.R., Baily, A.C. Materials Research Society	11 Conference Proceedings Batch Atomic Layer Deposition of HfO2 and ZrO2 Films Using Cyclopentadienyl Precursors P.R. Fischer, D. Pierreux, O. Rouault, J. Sirugue, P.M. Zagwijn Electrochemical Society
6 Conference Proceedings Comparison of ALD of HfO2, SiO2, and HfSiOx Thin Films Using Various Metal/Silicon Alkylamide Precursors and O3 L. Bartholomew, C. Barelli, J. Owyang, R. DiCarlo, D. Shenai Electrochemical Society	12 Conference Proceedings MORPHOLOGY AND MICROSTRUCTURE OF (111) CRYSTALLINE CeO2 FILMS GROWN ON AMORPHOUS SiO2 SUBSTRATES BY PULSED-LASER ABLATION Zhu, S., Lowndes, Douglas H., Budai, J. D., Thundat, T., Norton, D. P., Warmack, R. J. MRS - Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12