In-Line Non-Contact Micro-Kelvin Measurements Applied to ZrO2/Al2O3/ZrO2 Dielectric Stacks in the Active Capacitor Cell Areas of Advanced DRAM

In-Line Non-Contact Micro-Kelvin Measurements Applied to ZrO2/Al2O3/ZrO2 Dielectric Stacks in the Active Capacitor Cell Areas of Advanced DRAM

Author(s):

Publication title:

Physics and technology of high-k gate dielectrics 5

Title of ser.:

ECS transactions

Ser. no.:

11(4)

Pub. Year:

2007

Page(from):

377

Page(to):

392

Pages:

16

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

19385862

ISBN:

9781566775700 [1566775701]

Language:

English

Call no.:

E23400/11-4

Type:

Conference Proceedings

Details

TDL ID:	ZA00049542
Series ID:	PA00000034
Conf. info. (Name):	International Symposium on High Dielectric Constant Materials and Gate Stacks ; Meeting of the Electrochemical Society
Conf. info. (Number):	5th ; 212th
Conf. info. (Venue):	Washington, D.C., USA
Conf. info. (Date):	2007.10.08-2007.10.10
Note for article:	Fifth International Symposium on High Dielectric Constant Materials and Gate Stacks, held in Washington, DC from October 8 to 10, 200

Similar Items:

1 Conference Proceedings Dielectric and Electrode Thin Films for Stack-Cell Structured DRAM Capacitors with sub 50-nm Design Rules S. Kim, S. Lee, M. Sea, J. Han, C. Hwang Electrochemical Society	7 Conference Proceedings Performance and Reliability Improvement of Planar SOFC Stack with Advanced Design of Unit Cell and Sealing J. Lee, H. Kim, J. Son, J. Kim, H. Lee, H. Song Electrochemical Society
2 Conference Proceedings Practical Technology of Ta2O3 Stacked Capacitor for ULSI DRAMS Kamiyama, Suzuki; S., Sakao, M., Takaishi, Y., Yamamoto, I., Ono, H. Electrochemical Society	8 Conference Proceedings Micro-contact printing method for metal micro-patterning with PUA K. J. Han, Y. Chen, K. H. Yoo, K. S. Kang, J. Kim Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings Capacitor Dielectrics For Advanced Dram Applications Mathews, V.K., Fazan, P.C. Electrochemical Society	9 Conference Proceedings Short Stack Performance of Intermediate Temperature - Operating Solid Oxide Fuel Cells with Hydrocarbon Fuel Processor J. Bae, H. Jee, J. Kim, Y.S. Yoo Trans Tech Publications
4 Conference Proceedings IN-SITU MULTIPROCESSING OF ULTRATHIN SILICON NITRIDE CAPACITORS FOR ADVANCED DRAM CELLS Thakur, R. P. S., Hawthorne, R., Mathews, V. K., Fazan, P. C., Werkhoven, C .J., Granneman, E., Wilhelm, R. MRS - Materials Research Society	10 Conference Proceedings Barium Strontium Titanate Capacitors for Embedded DRAM Zurcher, P., Tracy, C. J., Jones, R. E., Jr., Alluri, P., Chu, P. Y., Jiang, B., Kim, M., Melnick, B. M., Raymond, M. … MRS - Materials Research Society
5 Conference Proceedings Electrical Properties of Ultrathin Stacked SiO2/ZrO2 Gate Dielectrics Chatterjee, S., Samanta, S.K., Banerjee, H.D., Maiti, C.K. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Al2O3/ZrO2/Al2O3 High-κ Dielectric Stacks on Germanium Substrates Grown by Atomic Layer Deposition at High and Low Temperatures O. Bethge, S. Abermann, C. Henkel, E. Bertagnolli Electrochemical Society
6 Conference Proceedings A Study on the Microstructures and Electrical Properties of ZrO2 Thin Films Nam, S.-W., Yoo, J.-H., Kim, H.-Y., Ko, D.-H., Yang, C.-W. Electrochemical Society	12 Conference Proceedings ADVANCED DRAM CELL DIELECTRIC FILMS USING RAPID THERMAL PROCESSING Thakur, R. P. S., Mathews, V. K., Fazan, P. C. MRS - Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12