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High-quality silicon nitride films prepared by low-frequency plasma-enhanced chemical vapor deposition

Author(s):
  • H. Zhang ( Univ. of Electronic Science and Technology of China, China )
  • X. Xu ( Univ. of Electronic Science and Technology of China, China )
  • Y. Leng ( Univ. of Electronic Science and Technology of China, China )
  • W. Li ( Univ. of Electronic Science and Technology of China, China )
  • Z. Wu ( Univ. of Electronic Science and Technology of China, China )
Publication title:
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7282
Pub. Year:
2009
Vol.:
2
Page(from):
728231-1
Page(to):
728231-11
Pages:
11
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819475428 [0819475424]
Language:
English
Call no.:
P63600/7282
Type:
Conference Proceedings

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