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Research on antireflection characteristic of rectangular subwavelength surface-relief structure

Author(s):
  • W. Tan ( Nanjing Univ. of Technology, China )
  • C. Lu ( Nanjing Univ. of Technology, China )
  • Z. Xu ( Nanjing Univ. of Technology, China )
  • Y. Ni ( Nanjing Univ. of Technology, China )
Publication title:
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7282
Pub. Year:
2009
Vol.:
2
Page(from):
72822M-1
Page(to):
72822M-7
Pages:
7
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819475428 [0819475424]
Language:
English
Call no.:
P63600/7282
Type:
Conference Proceedings

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