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Spacer double patterning technique for sub-40nm DRAM manufacturing process development

Author(s):
  • W. Shiu ( Nanya Technology Corp., Taiwan )
  • W. Ma ( Nanya Technology Corp., Taiwan )
  • H. W. Lee ( Nanya Technology Corp., Taiwan )
  • J. S. Wu ( Nanya Technology Corp., Taiwan )
  • Y. M. Tseng ( Nanya Technology Corp., Taiwan )
Publication title:
Lithography Asia 2008
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7140
Pub. Year:
2008
Vol.:
2
Page(from):
71403Y-1
Page(to):
71403Y-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473813 [0819473812]
Language:
English
Call no.:
P63600/7140
Type:
Conference Proceedings

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