Cycloolefin effect in cycloolefin-(meth)acryl copolymer

Cycloolefin effect in cycloolefin-(meth)acryl copolymer

Author(s):

H. S. Lim ( Korea Kumho Petrochemical Co., Ltd., Republic of Korea )
D. C. Seo ( Korea Kumho Petrochemical Co., Ltd., Republic of Korea )
C. S. Lee ( Korea Kumho Petrochemical Co., Ltd., Republic of Korea )
S. W. Park ( Korea Kumho Petrochemical Co., Ltd., Republic of Korea )
S. J. Kim ( Korea Kumho Petrochemical Co., Ltd., Republic of Korea )

Publication title:

Lithography Asia 2008

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

7140

Pub. Year:

2008

Vol.:

2

Page(from):

71403X-1

Page(to):

71403X-9

Pages:

9

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473813 [0819473812]

Language:

English

Call no.:

P63600/7140

Type:

Conference Proceedings

Details

TDL ID:	ZA00052771
Series ID:	PA00000029
Conf. info. (Name):	Lithography Asia
Conf. info. (Number):	2008
Conf. info. (Venue):	Taipei, Taiwan
Conf. info. (Date):	2008.11.04-2008.11.06
Note for article:	Lithography Asia 2008, 4-6 November 2008, Taipei, Taiwan - Poster Session, 71403X, 7140-142

Similar Items:

1 Conference Proceedings Materials design and lithographic performance of maleic anhydride/cycloolefin copolymer for ArF resist Park,J.-H., Kim,J.-Y., Seo,D.-C., Park,S.-Y., Lee,H., Kim,S.-J., Jung,J.-C., Baik,K.-H. SPIE - The International Society for Optical Engineering	7 Conference Proceedings Chemically amplified resists based on the norbornene copolymers with steroid derivatives Kim, J. -B., Lee, B. -W., Kang, J. -S., Kim, S. -J., Park, J. -H., Seo, D. -C., Balk, K. -H., Jung, J. -C., Roh, C. -H. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Novel approach for high resolution using cycloolefin-alt-maleic acid derivatives polymer for ArF lithography Lee, J.-B., Park, J.-H., Seo, D.-C., Kim, C.-M., Lim, Y.-T., Cho, S.-D., Joo, H.-S., Jeon, H.-P., Kim, S.-J. SPIE-The International Society for Optical Engineering	8 Conference Proceedings TuD3:Crystallization behavior of sputter-deposited nitrogen-doped amorphous Ge2Sb2Te5 thin films Seo,H., Jeong,T.-H., Park,J.-W., Yeon,C., Lee,D.-C., Kim,S.-J., Lim,H.-J., Kim,S.-Y. SPIE - The International Society for Optical Engineering
3 Conference Proceedings Novel single-layer photoresist containing cycloolefins for 193 nm Park,J.-H., Seo,D.-C., Kim,K.-D., Park,S.-Y., Kim,S.-J., Lee,H., Jung,J.-C., Bok,C.-K., Baik,K.-H. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Organic-Inorganic Nano Composite Membranes of Sulfonated Poly(ether Sulfone-Ketone) Copolymer and SiO2 for Fuel Cell Application D.H. Lee, H.S. Park, D.W. Seo, W.G. Kim Trans Tech Publications
4 Conference Proceedings New approach for 193-nm resist using modified cycloolefin resin Park, J.H., Seo, D.C., Kim, C.-M., Lim, Y.-T., Cho, S.-D., Lee, J.B., Joo,H.-S., Jeon, H.-P., Kim, S.-J., Jung, J.-C., … SPIE-The International Society for Optical Engineering	10 Conference Proceedings Synthesis and Characterization of Branched Sulfonated Poly(ether Sulfone-Ketone) Copolymer and Organic-Inorganic Nano Composite Membranes D.H. Lee, H.S. Park, D.W. Seo, T.W. Hong, S.C. Ur, W.G. Kim Trans Tech Publications
5 Conference Proceedings Improved lithographic performance of 193-nm photoresists based on cycloolefin/maleic anhydride copolymer by employing mixed PAGs Choi,S.-J., Choi,Y.-J., Kim,Y.-S., Kim,S.-D., Kim,D.-B., Kim,J.-H., Koh,C.-W., Lee,G., Jung,J.-C., Baik,K.-H. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Synthesis and Optical Properties of Cycloolefin Copolymers K.-B. Yoon, H.Y. Lee, D.-H Lee, S.K. Noh Elsevier
6 Conference Proceedings Terpolymer of maleic anhydride and cycloolefin derivatives as an ArF photoresist Kim,S.-J., Park,J.-H., Kim,J.-H., Kim,K.-D., Lee,H., Jung,J.-C., Bok,C.-K., Baik,K.-H. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Cycloolefin/cyanoacrylate (COCA) copolymers for 193-nm and 157-nm lithography Dammel, R.R., Sakamuri, R., Lee, S.-H., Rahman, M.D., Kudo, T., Romano, A.R., Rhodes, L.F., Lipian, J., Hacker, C., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12