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CD uniformity improvement of sub 60nm contact hole using model based OPC

Author(s):
  • H.-S. Yune ( Hynix Semiconductor Inc., Republic of Korea )
  • Y.-B. Ahn ( Hynix Semiconductor Inc., Republic of Korea )
  • J.-C. Kim ( Hynix Semiconductor Inc., Republic of Korea )
  • H.-J. Shin ( Hynix Semiconductor Inc., Republic of Korea )
  • G. Yoo ( Hynix Semiconductor Inc., Republic of Korea )
Publication title:
Lithography Asia 2008
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7140
Pub. Year:
2008
Vol.:
2
Page(from):
71403E-1
Page(to):
71403E-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473813 [0819473812]
Language:
English
Call no.:
P63600/7140
Type:
Conference Proceedings

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