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22nm 1:1 line and space patterning by using double patterning and resist reflow process

Author(s):
  • J.-M. Park ( Hanyang Univ., Republic of Korea )
  • J.-H. Yoo ( Hanyang Univ., Republic of Korea )
  • J.-Y. Hong ( Hanyang Univ., Republic of Korea )
  • I. An ( Hanyang Univ., Republic of Korea )
  • H.-K. Oh ( Hanyang Univ., Republic of Korea )
Publication title:
Lithography Asia 2008
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7140
Pub. Year:
2008
Vol.:
2
Page(from):
714038-1
Page(to):
714038-6
Pages:
6
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473813 [0819473812]
Language:
English
Call no.:
P63600/7140
Type:
Conference Proceedings

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