Pattern freezing process free litho-litho-etch double patterning
- Author(s):
- T. Ando ( Tokyo Ohka Kogyo Co., Ltd., Japan )
- M. Takeshita ( Tokyo Ohka Kogyo Co., Ltd., Japan )
- R. Takasu ( Tokyo Ohka Kogyo Co., Ltd., Japan )
- Y. Yoshii ( Tokyo Ohka Kogyo Co., Ltd., Japan )
- J. Iwashita ( Tokyo Ohka Kogyo Co., Ltd., Japan )
- Publication title:
- Lithography Asia 2008
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 7140
- Pub. Year:
- 2008
- Vol.:
- 2
- Page(from):
- 71402H-1
- Page(to):
- 71402H-8
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819473813 [0819473812]
- Language:
- English
- Call no.:
- P63600/7140
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Alternative process schemes for double patterning that eliminate the intermediate etch step
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Spectroscopic Ellipsometry based Scatterometry enabling 193nm Litho and Etch process control for the 110nm technology node and beyond
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Optimization of process window simulations for litho-friendly design framework [6349-47]
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
10
Conference Proceedings
Development of a plasma etch process for TaN absorber patterning on EUV masks
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Pitch doubling through dual-patterning lithography challenges in integration and litho budgets
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
PPC model build methodology: sequential litho and etch verification [6349-72]
SPIE - The International Society of Optical Engineering |