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Challenges of 29nm half-pitch NAND Flash STI patterning with 193nm dry lithography and self-aligned double patterning

Author(s):
  • M. C. Chiu ( Powerchip Semiconductor Corp., Taiwan )
  • B. S.-M. Lin ( Powerchip Semiconductor Corp., Taiwan )
  • M. F. Tsai ( Powerchip Semiconductor Corp., Taiwan )
  • Y. S. Chang ( Powerchip Semiconductor Corp., Taiwan )
  • M. H. Yeh ( Powerchip Semiconductor Corp., Taiwan )
Publication title:
Lithography Asia 2008
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7140
Pub. Year:
2008
Vol.:
1
Page(from):
714021-1
Page(to):
714021-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473813 [0819473812]
Language:
English
Call no.:
P63600/7140
Type:
Conference Proceedings

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