Effective solution to reticle haze formation at 193nm lithography
- Author(s):
- W.-J. Tseng ( Rexchip Electronics Corp., Taiwan )
- S.-H. Chiou ( Rexchip Electronics Corp., Taiwan )
- M.-C. Chiu ( Gudeng Precision Industrial Co., Ltd., Taiwan )
- P.-S. Lee ( Gudeng Precision Industrial Co., Ltd., Taiwan )
- Publication title:
- Lithography Asia 2008
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 7140
- Pub. Year:
- 2008
- Vol.:
- 1
- Page(from):
- 71401V-1
- Page(to):
- 71401V-8
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819473813 [0819473812]
- Language:
- English
- Call no.:
- P63600/7140
- Type:
- Conference Proceedings
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