Removal of particles from lithographic masks through plasma-assisted cleaning by metastable atomic neutralization
- Author(s):
- W. M. Lytle ( Univ. of Illinois at Urbana-Champaign, United States )
- D. S. Szybilski ( Univ. of Illinois at Urbana-Champaign, United States )
- C. E. Das ( Univ. of Illinois at Urbana-Champaign, United States )
- R. Raju ( Univ. of Illinois at Urbana-Champaign, United States )
- V. Surla ( Univ. of Illinois at Urbana-Champaign, United States )
- Publication title:
- Lithography Asia 2008
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 7140
- Pub. Year:
- 2008
- Vol.:
- 1
- Page(from):
- 71401S-1
- Page(to):
- 71401S-9
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819473813 [0819473812]
- Language:
- English
- Call no.:
- P63600/7140
- Type:
- Conference Proceedings
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