Development of EUV lithography tools at Nikon

Development of EUV lithography tools at Nikon

Author(s):

K. Murakami ( Nikon Corp., Japan )
T. Oshino ( Nikon Corp., Japan )
H. Kondo ( Nikon Corp., Japan )
H. Chiba ( Nikon Corp., Japan )
K. Nomura ( Nikon Corp., Japan )

Publication title:

Lithography Asia 2008

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

7140

Pub. Year:

2008

Vol.:

1

Page(from):

71401C-1

Page(to):

71401C-8

Pages:

8

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473813 [0819473812]

Language:

English

Call no.:

P63600/7140

Type:

Conference Proceedings

Details

TDL ID:	ZA00052771
Series ID:	PA00000029
Conf. info. (Name):	Lithography Asia
Conf. info. (Number):	2008
Conf. info. (Venue):	Taipei, Taiwan
Conf. info. (Date):	2008.11.04-2008.11.06
Note for article:	Lithography Asia 2008, 4-6 November 2008, Taipei, Taiwan - EUV Scanner and Sources, Invited paper, 71401C, 7140-47

Similar Items:

1 Conference Proceedings Development of optics for EUV lithography tools K. Murakami, T. Oshino, H. Kondo, H. Chiba, H. Komatsuda, K. Nomura, H. Iwata SPIE - The International Society of Optical Engineering	7 Conference Proceedings Feasibility study of EUV scanners Ota,K., Murakami,K., Kondo,H., Oshino,T., Sugisaki,K., Komatsuda,H. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Development status of projection optics and illumination optics for EUV1 K. Murakami, T. Oshino, H. Kondo, H. Chiba, H. Komatsuda Society of Photo-optical Instrumentation Engineers	8 Conference Proceedings Fabrication of aspherical mirrors for EUV projection optics set-3 of HiNA Oshino, T., Takahashi, S., Yamamoto, T., Miyoshi, T., Shiraishi, M., Komiya, T., Kandaka, N., Kondo, H., Mashima, K., … SPIE - The International Society of Optical Engineering
3 Conference Proceedings Fabrication of aspherical mirrors for HiNA (high numerical aperture EUV exposure tool) set-3 projection optics Oshino, T., Yamamoto, T., Miyoshi, T., Shiraishi, M., Komiya, T., Kandaka, N., Kondo, H., Mashima, K., Nomura, K., … SPIE - The International Society of Optical Engineering	9 Conference Proceedings Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes Murakami, K., Saito, J., Ota, K., Kondo, H., Ishii, M., Kawakami, J., Oshino, T., Sugisaki, K., Zhu, Y., Hasegawa, M., … SPIE-The International Society for Optical Engineering
4 Conference Proceedings Development of illumination optics and projection optics for high-NA EUV exposure tool (HiNA) Oshino, T., Shiraishi, M., Kandaka, N., Sugisaki, K., Kondo, H., Ota, K., Mashima, K., Murakami, K., Oizumi, H., … SPIE-The International Society for Optical Engineering	10 Conference Proceedings Three-aspherical-mirror system for EUV lithography (Invited Paper) Kinoshita,H., Watanabe,T., Niibe,M., Ito,M., Oizumi,H., Yamanashi,H., Murakami,K., Oshino,T., Platonov,Y.Y., Grupido,N. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Development of an EUV reflectometer using a laser plasma x-ray source Kondo,H., Kandaka,N., Sugisaki,K., Oshino,T., Shiraishi,M., Ishiyama,W., Murakami,K. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Nikon EUVL development progress update T. Miura, K. Murakami, K. Suzuki, Y. Kohama, K. Morita Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings Development of an EUV reflectometer using a single line emission from a laser-plasma x-ray source Kandaka,N., Kondo,H., Sugisaki,K., Oshino,T., Shiraishi,M., Ishiyama,W., Murakami,K. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Nikon F2 exposure tool development Owa, S., Matsumoto, Y., Ohmura, Y., Sakuma, S., Aoki, T., Nishikawa, J., Nagasaka, H., Mizutani, T., Shiraishi, N., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12