Blank Cover Image

Extending KrF lithography beyond 80nm with the TWINSCAN XT:1000H 0.93NA scanner

Author(s):
Publication title:
Lithography Asia 2008
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7140
Pub. Year:
2008
Vol.:
1
Page(from):
71401B-1
Page(to):
71401B-11
Pages:
11
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473813 [0819473812]
Language:
English
Call no.:
P63600/7140
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Beyond k1=0.25 lithography: 70-nm L/S patterning using KrF scanners

Ebihara, T., Levenson, M.D., Liu, W., He, J., Yeh, W., Ahn, S., Oga, T., Shen, M., M'saad, H.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Extending KrF to 100-nm imaging with high-NA- and chromeless phase lithography technology

Socha, R.J., Van Den Broeke, D.J., Yu, L., Conley, W., Wu, W., Chen, J.F., Petersen, J.S., Gerold, D.J., van Praagh, J., …

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Implementation of double dipole lithography for 45-nm node poly and diffusion layer manufacturing with 0.93NA

M. -H. Wu, M. Hsu, S. Hsu, B. -J. Lu, Y. -F. Cheng, Y. -L. Chou, C. -H. Yang

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Yield aware design of gate layer for 45 nm CMOS-ASIC using a high-NA dry KrF systems

E. Vreugdenhil, H. Benten, L. Reijnen, G. Dicker, J.-W. Gemmink

Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings System qualification and optimization for imaging performance on the 0.80-NA 248-nm step-and-scan systems

van Ingen Schenau, K., Bakker, H., Zellenrath, M., Moerman, R., Linders, J., Rohe, T., Emer, W.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Feasibility study of splitting pitch technology on 45-nm contact patterning with 0.93 NA

Y. F. Cheng, Y. L. Chou, T. C. Tseng, B. Y. Hsueh, C. H. Yang

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Feasibility study of 45nm metal patterning with 0.93 NA

Y. F. Cheng, Y. L. Chou, Y. C. Hou, B. J. Lu, C. H. Yang

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Performance of a high-NA dual-stage 193-nm TWINSCAN Step and Scan system for 80-nm applications

Klerk, J., Jorritsma, L., Setten, E., Droste, R., Jongh, R.C., Hansen, S.G., Smith, D., Kerkhof, M.A., Mast, F., …

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Application of new thin BARC technology for KrF lithography at 80-nm node device

Kim, M.-S., Shim, K.-C., Kim, H.-J., Kwon, K.-S., Lee, H.-G., Lee, C.-S., Gil, M.-G., Song, Y.-W.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings 100-nm node lithography with KrF?

Ferri,J.E., Tyrrell,B., Astolfi,D.K., Yost,D., Davis,P., Wheeler,B., Mallen,R., Jarmolowicz,J., Cann,S.G., Liu,H.Y., …

SPIE-The International Society for Optical Engineering
6 Conference Proceedings 130-nm KrF lithography for DRAM production with 0.68-NA scanner

Kawamura,E., Nagai,K., Kanemitsu,H., Tabata,Y., Inoue,S.

SPIE - The International Society for Optical Engineering
12 Conference Proceedings Enabling the 45nm node by hyper-NA polarized lithography [6154-11]

De Boeij, W., Swinkels, G, Le Masson, N., Koolen, A., Van Greevembroek, H., Klaassen, M., Van de Kerkhof, M., Van Ingen …

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12