Resist-based polarization monitoring for 193nm high-numerical aperture lithography

Resist-based polarization monitoring for 193nm high-numerical aperture lithography

Author(s):

R. Tu ( Benchmark Technologies, United States )
G. McIntyre ( IBM Advanced Lithography Research, United States )

Publication title:

Lithography Asia 2008

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

7140

Pub. Year:

2008

Vol.:

1

Page(from):

714019-1

Page(to):

714019-10

Pages:

10

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473813 [0819473812]

Language:

English

Call no.:

P63600/7140

Type:

Conference Proceedings

Details

TDL ID:	ZA00052771
Series ID:	PA00000029
Conf. info. (Name):	Lithography Asia
Conf. info. (Number):	2008
Conf. info. (Venue):	Taipei, Taiwan
Conf. info. (Date):	2008.11.04-2008.11.06
Note for article:	Lithography Asia 2008, 4-6 November 2008, Taipei, Taiwan - Optical (Imaging) II, 714019, 7140-44

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