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An innovative Source-Mask co-Optimization (SMO) method for extending low k1 imaging

Author(s):
  • S. Hsu ( ASML Brion Technologies, Inc., United States )
  • L. Chen ( ASML Brion Technologies, Inc., United States )
  • Z. Li ( ASML Brion Technologies, Inc., United States )
  • S. Park ( ASML Brion Technologies, Inc., United States )
  • K. Gronlund ( ASML Brion Technologies, Inc., United States )
Publication title:
Lithography Asia 2008
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7140
Pub. Year:
2008
Vol.:
1
Page(from):
714010-1
Page(to):
714010-10
Pages:
10
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473813 [0819473812]
Language:
English
Call no.:
P63600/7140
Type:
Conference Proceedings

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