Optimizing integrated optical CD monitoring by floating pre-process variations in a complex multi-layer structure

Optimizing integrated optical CD monitoring by floating pre-process variations in a complex multi-layer structure

Author(s):

M. Strobl ( Inotera Memories Inc., Taiwan )
L. Huang ( Inotera Memories Inc., Taiwan )
A. Li ( Tokyo Electron Taiwan Ltd., Taiwan )
Y. Luo ( Timbre Technology, Inc., United States )
Y. Wen ( Timbre Technology, Inc., United States )

Publication title:

Lithography Asia 2008

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

7140

Pub. Year:

2008

Vol.:

1

Page(from):

71400G-1

Page(to):

71400G-12

Pages:

12

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473813 [0819473812]

Language:

English

Call no.:

P63600/7140

Type:

Conference Proceedings

Details

TDL ID:	ZA00052771
Series ID:	PA00000029
Conf. info. (Name):	Lithography Asia
Conf. info. (Number):	2008
Conf. info. (Venue):	Taipei, Taiwan
Conf. info. (Date):	2008.11.04-2008.11.06
Note for article:	Lithography Asia 2008, 4-6 November 2008, Taipei, Taiwan - CD Metrology, 71400G, 7140-15

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