Current benchmarking results of EUV resist at Selete

Author(s):

• D. Kawamura ( Semiconductor Leading Edge Technologies, Inc., Japan )
• K. Kaneyama ( Semiconductor Leading Edge Technologies, Inc., Japan )
• S. Kobayashi ( Semiconductor Leading Edge Technologies, Inc., Japan )
• H. Oizumi ( Semiconductor Leading Edge Technologies, Inc., Japan )
• T. Itani ( Semiconductor Leading Edge Technologies, Inc., Japan )

Publication title:

Lithography Asia 2008

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

7140

Pub. Year:

2008

Vol.:

1

Page(from):

714008-1

Page(to):

714008-9

Pages:

9

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473813 [0819473812]

Language:

English

Call no.:

P63600/7140

Type:

Conference Proceedings