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Fabrication of transmission gratings for extreme ultraviolet interference lithography

Author(s):
  • J. Ma ( Institute of Microelectronics, China )
  • X. Zhu ( Institute of Microelectronics, China )
  • W. Zhu ( Shanghai Institute of Applied Physics, China )
  • C. Xie ( Institute of Microelectronics, China )
  • T. Ye ( Institute of Microelectronics, China )
Publication title:
Fifth International Symposium on Instrumentation Science and Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7133
Pub. Year:
2008
Vol.:
2
Page(from):
713336-1
Page(to):
713336-7
Pages:
7
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473677 [0819473677]
Language:
English
Call no.:
P63600/7133
Type:
Conference Proceedings

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