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The study of CD behavior due to transmission control position change within photomask substrate

Author(s):
  • M. Kim ( Hynix Semiconductor, Inc., South Korea )
  • H. Lee ( Hynix Semiconductor, Inc., South Korea )
  • S. Woo ( Hynix Semiconductor, Inc., South Korea )
  • K. Seo ( Hynix Semiconductor, Inc., South Korea )
  • Y. Choi ( Hynix Semiconductor, Inc., South Korea )
Publication title:
Photomask technology 2008
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7122
Pub. Year:
2008
Vol.:
2
Page(from):
712239-1
Page(to):
712239-7
Pages:
7
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473554 [0819473553]
Language:
English
Call no.:
P63600/7122
Type:
Conference Proceedings

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