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70nm DRAM intra-field CDU improvement by dose modulation on mask transmittance

Author(s):
  • T. Chin ( Nanya Technology Corp., Taiwan )
  • W. B. Wu ( Nanya Technology Corp., Taiwan )
  • C. L. Shih ( Nanya Technology Corp., Taiwan )
  • P. C. Fan ( Nanya Technology Corp., Taiwan )
  • G. B. Zvi ( Pixer Technology, Ltd., Israel )
Publication title:
Photomask technology 2008
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7122
Pub. Year:
2008
Vol.:
2
Page(from):
712238-1
Page(to):
712238-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473554 [0819473553]
Language:
English
Call no.:
P63600/7122
Type:
Conference Proceedings

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