Blank Cover Image

Mask patterning for the 22nm node using a proton multi-beam projection pattern generator (Second Place Best Poster Award)

Author(s):
Publication title:
Photomask technology 2008
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7122
Pub. Year:
2008
Vol.:
2
Page(from):
712236-1
Page(to):
712236-10
Pages:
10
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473554 [0819473553]
Language:
English
Call no.:
P63600/7122
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Resistless mask structuring using an ion multi-beam projection pattern generator

J. Butschke, M. Irmscher, F. Letzkus, H. Loeschner, L. Nedelmann

Society of Photo-optical Instrumentation Engineers
7 Conference Proceedings Second-level imaging of advanced alternating phase-shift masks using e-beam lithography

Leibold, B., Butschke, J., Bettin, L., Beyer, D., Irmscher, M., Koepernik, C., Plontke, R., Vix, A., Voehringer, P.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Deflection unit for multi-beam mask making (First Place Best Poster Award)

F. Letzkus, J. Butschke, M. Irmscher, M. Jurisch, W. Klingler

Society of Photo-optical Instrumentation Engineers
8 Conference Proceedings Process window enhancement for 45-nm node using alterable transmission phase-shifting materials [6349-19]

Becker, H., Renno, M., Hess, G., Buttgereit, U., Koepernik, C., Nedelmann, L., Irmscher, M., Birkner, R., Zibold, A., …

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Fabrication of nano-imprint templates for dual-Damascene applications using a high resolution variable shape E-beam writer

M. Pritschow, J. Butschke, M. Irmscher, H. Sailer, D. Resnick

Society of Photo-optical Instrumentation Engineers
9 Conference Proceedings Patterning performance of most recent e-beam-sensitive CARs for advanced mask making: an update

Schwersenz, A., Butschke, J., Feicke, A., Irmscher, M., Voehringer, P.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Patterning of Ta/Si02 high transmission EAPSM material for 193nm technology [5853-26]

Koepernik, C., Becker, H. W., Butschke, J., Buttgereit, U., Irmscher, M., Nedelmann, L., Schmidt, F., Teuber, S.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Alternating aperture phase shift mask process using e-beam lithography for the second level

Koepernik, C., Butschke, J., Beyer, D., Irmscher, M., Leibold, B., Rausa, E., Plontke, R., Plumhoff, J., Voehringer, P.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Extended process window using variable transmission PSM materials for 65 nm and 45 nm node [6283-120]

Koepernik, C., Becker, H., Brikner, R., Buttgereit, U., Irmscher, M., Nedelmann, L., Zibold, A.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Properties of a 248-nm DUV laser mask pattern generator for the 90-nm and 65-nm technology nodes

Aman, J., Fosshaug, H.A., Hedqvist, T., Harkesjo, J., Hogfeldt, P., Jacobsson, M., Karawajczyk, A., Karlsson, J., …

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Evaluation of e-beam repair for nanoimprint templates

M. Pritschow, V. Boegli, J. Butschke, M. Irmscher, D. Resnick

Society of Photo-optical Instrumentation Engineers
12 Conference Proceedings Determination of mask layer stress by placement metrology [5992-130]

Butschke, J., Buttgereit, U., Cotte, E., Hess, G., Irmscher, M., Seitz, H.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12