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Mask process monitoring with optical CD measurements for sub-50-nm

Author(s):
  • K.-Y. Bang ( SAMSUNG Electronics Co., Ltd., Republic of Korea )
  • J.-B. Park ( SAMSUNG Electronics Co., Ltd., Republic of Korea )
  • J.-H. Roh ( SAMSUNG Electronics Co., Ltd., Republic of Korea )
  • D.-H. Chung ( SAMSUNG Electronics Co., Ltd., Republic of Korea )
  • S.-Y. Cho ( SAMSUNG Electronics Co., Ltd., Republic of Korea )
Publication title:
Photomask technology 2008
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7122
Pub. Year:
2008
Vol.:
2
Page(from):
71222V-1
Page(to):
71222V-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473554 [0819473553]
Language:
English
Call no.:
P63600/7122
Type:
Conference Proceedings

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