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Compute resource management and turn around time control in mask data prep

Author(s):
  • T. Lewis ( AMD, United States )
  • S. Goad ( AMD, United States )
  • K. Jantzen ( Mentor Graphics Corp., United States )
  • A. Nouh ( Mentor Graphics Corp., United States )
  • M. Park ( Mentor Graphics Corp., United States )
Publication title:
Photomask technology 2008
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7122
Pub. Year:
2008
Vol.:
2
Page(from):
71222O-1
Page(to):
71222O-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473554 [0819473553]
Language:
English
Call no.:
P63600/7122
Type:
Conference Proceedings

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