An investigation of EUV lithography defectivity

An investigation of EUV lithography defectivity

Author(s):

K. D. Cummings ( ASML, United States )
T. Laursen ( ASML, United States )
B. Pierson ( ASML, United States )
S. Han ( ASML, United States )
R. Watso ( ASML, United States )

Publication title:

Photomask technology 2008

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

7122

Pub. Year:

2008

Vol.:

2

Page(from):

71222G-1

Page(to):

71222G-13

Pages:

13

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473554 [0819473553]

Language:

English

Call no.:

P63600/7122

Type:

Conference Proceedings

Details

TDL ID:	ZA00052753
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2008 : 28th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2008.10.07-2008.10.10
Note for article:	Photomask technology 2008, 7-10 October 2008, Monterey, California, USA - Session 20. EUV Mask Inspection II, 71222G, 7122-88

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