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32nm 1-D regular pitch SRAM bitcell design for interference-assisted lithography

Author(s):
  • R. T. Greenway ( Petersen Advanced Lithography, United States )
  • K. Jeong ( Univ. of California, San Diego, United States )
  • A. B. Kahng ( Univ. of California, San Diego, United States )
  • C.-H. Park ( Univ. of California, San Diego, United States )
  • J. S. Petersen ( Petersen Advanced Lithography, United States )
Publication title:
Photomask technology 2008
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7122
Pub. Year:
2008
Vol.:
1
Page(from):
71221L-1
Page(to):
71221L-12
Pages:
12
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473554 [0819473553]
Language:
English
Call no.:
P63600/7122
Type:
Conference Proceedings

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