Novel mask inspection flow using Sensitivity Control Layers (SCL) on the TeraScanHR-587 platform

Novel mask inspection flow using Sensitivity Control Layers (SCL) on the TeraScanHR-587 platform

Author(s):

S. Hedges ( Phontronics nanoFab North America, United States )
C. Le ( Micron Technology, United States )
M. Eickhoff ( KLA-Tencor Corp., United States )
M. Wylie ( KLA-Tencor Corp., United States )
T. Simmons ( Micron Technology, United States )

Publication title:

Photomask technology 2008

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

7122

Pub. Year:

2008

Vol.:

1

Page(from):

71221G-1

Page(to):

71221G-9

Pages:

9

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473554 [0819473553]

Language:

English

Call no.:

P63600/7122

Type:

Conference Proceedings

Details

TDL ID:	ZA00052753
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2008 : 28th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2008.10.07-2008.10.10
Note for article:	Photomask technology 2008, 7-10 October 2008, Monterey, California, USA - Session 11. Inspection, 71221G, 7122-51

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