Optimal mask characterization by Surrogate Wafer Print (SWaP) method
- Author(s):
- K. R. Kimmel ( Advanced Mask Technology Ctr. GmbH & Co. KG, Germany )
- I. Hoellein ( Advanced Mask Technology Ctr. GmbH & Co. KG, Germany )
- J. H. Peters ( Advanced Mask Technology Ctr. GmbH & Co. KG, Germany )
- P. Ackmann ( Advanced Micro Devices, Inc., United States )
- B. Connolly ( Toppan Photomasks, Inc., Germany )
- Publication title:
- Photomask technology 2008
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 7122
- Pub. Year:
- 2008
- Vol.:
- 1
- Page(from):
- 712219-1
- Page(to):
- 712219-10
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819473554 [0819473553]
- Language:
- English
- Call no.:
- P63600/7122
- Type:
- Conference Proceedings
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