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A new paradigm for haze improvement: retardation of haze occurrence by creating mask substrate insensitive to chemical contamination level

Author(s):
  • H. Lee ( SAMSUNG Electronics Co., Ltd., Republic of Korea )
  • J. Choi ( SAMSUNG Electronics Co., Ltd., Republic of Korea )
  • J. Jung ( SAMSUNG Electronics Co., Ltd., Republic of Korea )
  • J. Oh ( SAMSUNG Electronics Co., Ltd., Republic of Korea )
  • S. Kang ( SAMSUNG Electronics Co., Ltd., Republic of Korea )
Publication title:
Photomask technology 2008
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7122
Pub. Year:
2008
Vol.:
1
Page(from):
712217-1
Page(to):
712217-11
Pages:
11
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473554 [0819473553]
Language:
English
Call no.:
P63600/7122
Type:
Conference Proceedings

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