Challenges for the quality control of assist features for 45nm node technology and beyond

Challenges for the quality control of assist features for 45nm node technology and beyond

Author(s):

L. Wang ( Spansion LLC, United States )
T. Lukanc ( Spansion LLC, United States )
M. Takahashi ( Spansion LLC, United States )
H.-E. Kim ( Spansion LLC, United States )
K. Phan ( Spansion LLC, United States )

Publication title:

Photomask technology 2008

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

7122

Pub. Year:

2008

Vol.:

1

Page(from):

71220Z-1

Page(to):

71220Z-11

Pages:

11

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473554 [0819473553]

Language:

English

Call no.:

P63600/7122

Type:

Conference Proceedings

Details

TDL ID:	ZA00052753
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2008 : 28th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2008.10.07-2008.10.10
Note for article:	Photomask technology 2008, 7-10 October 2008, Monterey, California, USA - Session 7. RET and OPC/ORC I, 71220Z, 7122-34

Similar Items:

1 Conference Proceedings Photomask blanks quality and functionality improvement challenges for the 130-nm node and beyond Kobayashi,H., Ushida,M., Ueno,K. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Dimension controlled CNT probe of AFM metrology tool for 45-nm node and beyond S. Sekino, T. Morimoto, T. Kurenuma, M. Hiraoka, H. Tanaka Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings Analysis of precise CD control for 45nm node and beyond Cheng, Y. F., Wu, T. H., Lin, C. L., Chang, S. Y., Lin, B. SPIE - The International Society of Optical Engineering	8 Conference Proceedings High-performance reticle inspection tool for the 65-nm node and beyond T. -Y. Kang, C. -H. Chen, C. -H. Ho, L. Hsu, Y. -C. Ku, K. Nakamura, H. Moribe, T. Bashomatsu, K. Matsumura, K. Hatta, … SPIE - The International Society of Optical Engineering
3 Conference Proceedings EBDW technology for EB shuttle at 65nm node and beyond T. Maruyama, M. Takakuwa, Y. Kojima, Y. Takahashi, K. Yamada Society of Photo-optical Instrumentation Engineers	9 Conference Proceedings Mask enhancer technology for 45-nm node contact hole fabrication Yuito, T., Wiaux, V., Look, L. Van, Vandenberghe, G., Irie, S., Matsuo, T., Misaka, A., Watanabe, H., Sasago, M. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Alternating phase-shift mask and binary mask for 45-nm node and beyond: the impact on the mask error control Y. Kojima, M. Shirasaki, K. Chiba, T. Tanaka, Y. Inazuki, H. Yoshikawa, S. Okazaki, K. Iwase, K. Ishikawa, K. Ozawa SPIE - The International Society of Optical Engineering	10 Conference Proceedings Challenges in FEOL Logic Device Integration for 32 nm Technology Node and Beyond D. Park, M. Chudzik, H. Yin Electrochemical Society
5 Conference Proceedings A novel plasma-assisted shrink process to enlarge process windows of narrow trenches and contacts for 45-nm node applications and beyond M. O. de Beeck, J. Versluijs, Z. Tokei, S. Demuynck, J. D. Marneffe, W. Boullart, S. Vanhaelemeersch, H. Zhu, P. … SPIE - The International Society of Optical Engineering	11 Conference Proceedings Self-assembled porous silica/Cu damascene interconnects for 45nm node and beyond (invited Papre) [6002-23] Kikkawa T., Yagi R., Chikaki S., Shimoyama M., Ono T., Fujii N., Kohmura K., Tanaka H., Nakayama T., Ishikawa A., Motsuo … SPIE - The International Society of Optical Engineering
6 Conference Proceedings Overcoming mask etch challenges for 45 nm and beyond M. Chandrachood, T. Y. B. Leung, K. Yu, M. Grimbergen, S. Panoyil Society of Photo-optical Instrumentation Engineers	12 Conference Proceedings Multi-layer resist system for 45-nm-node and beyond: Part II [6349-121] Fujimura, Y., Morimoto, J., Manoshiro, A., Shimizu, M., Takamizawa, H., Hashimoto, M., Shiratori, H., Horii, K., Yokoya, … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12