Advanced mask technique to improve bit line CD uniformity of 90 nm node flash memory in low-K1 lithography

Advanced mask technique to improve bit line CD uniformity of 90 nm node flash memory in low-K1 lithography

Author(s):

J. Kim ( Dongbu HiTek, Republic of Korea )
J. Choi ( Dongbu HiTek, Republic of Korea )
J. Han ( Dongbu HiTek, Republic of Korea )

Publication title:

Photomask technology 2008

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

7122

Pub. Year:

2008

Vol.:

1

Page(from):

71220X-1

Page(to):

71220X-6

Pages:

6

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819473554 [0819473553]

Language:

English

Call no.:

P63600/7122

Type:

Conference Proceedings

Details

TDL ID:	ZA00052753
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2008 : 28th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2008.10.07-2008.10.10
Note for article:	Photomask technology 2008, 7-10 October 2008, Monterey, California, USA - Session 7. RET and OPC/ORC I, 71220X, 7122-32

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